| 摘要 |
PURPOSE: To reduce an orthogonal degree error of a shot arrangement in a shot region of a fore layer or a superposition error in the case of generated shot rotation in the case of exposure by means of an aligner having exposure fields of different sizes under a mix-and-match system. CONSTITUTION: A circuit pattern is formed in the shot regions SA11 , SA12 , SA13 , SA14 of the respective one side lengths L of a fore layer by means of a first aligner or the like, moreover, an orthogonal degree error W is generated in its shot arrangement. Before exposure on a shot region SB1 thereon by means of an aligner having a four-fold exposure field, the center of the shot region SB1 is adjusted to the center 25 of four shot regions of SA11 to SA14 and the shot region SB1 turned by a turn angleδ. The turning angleδis set to W/4. It is the same with a shot turn is generated.
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