| 摘要 |
PURPOSE: To ensure uniform polishing the surface of a substrate and between substrates by disposing a plurality of polishing means in which distances of rotary boars from the center are different from each other, and a radius of the rotary board covers a locus drawn on the rotary board upon polishing. CONSTITUTION: Polishing cloth 1 is sticked over a rotary board 2, and a substrate 4 of a substrate holder 5 is slidably held on the polishing cloth 1 in close contact with the same. First, second, and third polishing heads 6, 7, and 8 are disposed in order from the center of the rotary board 2 to the outer periphery of the same at a predetermined position on the upstream side of the substrate holder 5. A slurry like polishing agent 3 is supplied onto the polishing cloth 1 between the first polishing head 6 and the second polishing head 7 and between the second polishing head 7 and the third polishing head 8. The entire surface of the polishing cloth 1 is polished with the three polishing heads 6 to 8 such that a radius of the rotary board 2 covers loci T1 to T3 drawn by the bottom surface of the rotary board by the rotation of the rotary board 2. Accordingly, uniform polishing is ensured. |
