Tubular quartz glass reactor for semiconductor prodn. - has a flange and a structured transparent and opaque section

摘要

The tubular quartz glass component, especially as a reactor for use in a temp. range of 800-1350[deg]C, has a flange of transparent quartz glass. The heat barrier has an opaque and transparent quartz glass section, and a mean length L = alpha (In(T- gamma X In W/d) - delta ) computed from the end surface of the flange, where alpha is a proportionality factor of 520-850 mm/K. On a high thermal resistance, the opaque quartz glass section is in the lower range of the values, and on a low thermal resistance it is in the upper range. T is the max. application temp. of the component in [deg]K, gamma is 286 K X mm/Watt, d is the wall thickness of the thermal barrier, W is = 2 Watt and pref. = 1 Watt, delta is 7.305 K. The opaque section of the thermal barrier is min. L/2, and the transparent section from the end surface of the flange towards the tube section is min. twice the flange thickness. The opaque section of the barrier is at the end of the barrier away from the end surface of the flange.