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发明名称
CLEANING METHOD FOR A SEMICONDUCTOR WAFER
摘要
申请公布号
KR970000420(B1)
申请公布日期
1997.01.09
申请号
KR19920011219
申请日期
1992.06.26
申请人
TOSHIBA KK
发明人
HUKAZAWA, YUJI;NAKAHIMA, DAKAHITO;DAKASE, GAZHICO
分类号
H01L21/304;(IPC1-7):H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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