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发明名称
X-ray exposure apparatus and semiconductor-device manufacturing method
摘要
申请公布号
EP0540302(B1)
申请公布日期
1997.01.08
申请号
EP19920309856
申请日期
1992.10.28
申请人
CANON KABUSHIKI KAISHA
发明人
EBINUMA, RYUICHI
分类号
G21K5/04;G03F7/20;H01L21/027;(IPC1-7):G03F7/20
主分类号
G21K5/04
代理机构
代理人
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