Lithographic photomask production apparatus for LSI semiconductor manufacture

摘要

The apparatus (30) includes a grid data producing device (32), a grid-data memory circuit (33), a correction processing device (34), and an output controller (35). The data producing device, e.g. four parallel processing MPUs, receives data corresponding to a photomask to produce grid data which will be used in the production of a photomask pattern by a pattern irradiation device (10). The grid data is stored in the grid-data memory, data stored there being corrected by the correction device, e.g. four further parallel processing MPUs, before being sent to the pattern irradiation device. The correction is carried out so that photomask carries a desired resist pattern which is exposed by irradiation light through a photomask so that the produced photomask pattern is transferred via the resist, after which the resist is developed.