发明名称 |
Process for preparing a silicon carbide sintered body for use in semiconductor equipment |
摘要 |
A process for the preparation of a silicon carbide sintered body of high purity which has a content of 1 ppm or less of each atom harmful to the manufacture of semiconductor equipment including the step of shaping a silicon carbide powder, calcining the shaped body in a non-oxidizing atmosphere to form a porous body, and subjecting the porous body to reaction sintering while being impregnated with molten metallic silicon. The starting silicon carbide powder also has a content of 1 ppm or less of each harmful atom and it has a free carbon content of not greater than 20% by weight and an average particle diameter of 0.5-20 mu m. Such silicon carbide powder can be prepared from a carbon- and silicon-containing starting mixture including at least one liquid hydrolyzable silicon compound and at least one carbonaceous material selected from polymerizable or cross-linkable organic compounds prepared in the presence of a catalyst which is substantially free from harmful atoms by solidifying the starting mixture and heating it so as to react and form silicon carbide.
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申请公布号 |
US5589116(A) |
申请公布日期 |
1996.12.31 |
申请号 |
US19940181945 |
申请日期 |
1994.01.18 |
申请人 |
SUMITOMO METAL INDUSTRIES, LTD. |
发明人 |
KOJIMA, SHOICHI;MINAGAWA, KAZUHIRO;KANO, HARUYUKI;MIYAZAKI, TADAAKI;WADA, HIROAKI |
分类号 |
C01B31/36;(IPC1-7):C04B35/54;C04B35/56 |
主分类号 |
C01B31/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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