发明名称 Method of depositing chromium and silicon on a metal to form a diffusion coating
摘要 A method for the simultaneous deposition of chromium and silicon to form a diffusion coating on a workpiece uses a halide-activated cementation pack with a dual halide activator. Elemental metal powders may be employed with the dual activator. A two-step heating schedule prevents blocking a chromium carbide from forming at the surface of the workpiece. Small contents of either Ce or V can be added to the Cr+Si contents of the coating by introducing oxides of Ce or V into the filler of the pack.
申请公布号 US5589220(A) 申请公布日期 1996.12.31
申请号 US19950550108 申请日期 1995.10.30
申请人 THE OHIO STATE UNIVERSITY RESEARCH FOUNDATION 发明人 RAPP, ROBERT A.;WANG, GE;PANGESTUTI, ENDANG
分类号 C23C10/54;(IPC1-7):B05D5/12 主分类号 C23C10/54
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