发明名称 |
Method of depositing chromium and silicon on a metal to form a diffusion coating |
摘要 |
A method for the simultaneous deposition of chromium and silicon to form a diffusion coating on a workpiece uses a halide-activated cementation pack with a dual halide activator. Elemental metal powders may be employed with the dual activator. A two-step heating schedule prevents blocking a chromium carbide from forming at the surface of the workpiece. Small contents of either Ce or V can be added to the Cr+Si contents of the coating by introducing oxides of Ce or V into the filler of the pack.
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申请公布号 |
US5589220(A) |
申请公布日期 |
1996.12.31 |
申请号 |
US19950550108 |
申请日期 |
1995.10.30 |
申请人 |
THE OHIO STATE UNIVERSITY RESEARCH FOUNDATION |
发明人 |
RAPP, ROBERT A.;WANG, GE;PANGESTUTI, ENDANG |
分类号 |
C23C10/54;(IPC1-7):B05D5/12 |
主分类号 |
C23C10/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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