发明名称 |
Method of making increased-density flash EPROM that utilizes a series of planarized, self-aligned, intermediate strips of conductive material to contact the drain regions |
摘要 |
A series of self-aligned, intermediate strips of conductive material, which contact each of the drain regions in a corresponding number of columns of drain regions in a flash electrically programmable read-only-memory (EPROM), are formed as a thick layer of planarized polysilicon. By utilizing intermediate strips of conductive material which are formed from a thick layer of polysilicon, the formation of cracks or voids in the intermediate strips of conductive material can be eliminated.
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申请公布号 |
US5589412(A) |
申请公布日期 |
1996.12.31 |
申请号 |
US19950456548 |
申请日期 |
1995.06.01 |
申请人 |
NATIONAL SEMICONDUCTOR CORPORATION |
发明人 |
IRANMANESH, ALI;PIERCE, JOHN M.;BERGEMONT, ALBERT M. |
分类号 |
H01L21/8247;H01L27/115;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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