发明名称 Method of making increased-density flash EPROM that utilizes a series of planarized, self-aligned, intermediate strips of conductive material to contact the drain regions
摘要 A series of self-aligned, intermediate strips of conductive material, which contact each of the drain regions in a corresponding number of columns of drain regions in a flash electrically programmable read-only-memory (EPROM), are formed as a thick layer of planarized polysilicon. By utilizing intermediate strips of conductive material which are formed from a thick layer of polysilicon, the formation of cracks or voids in the intermediate strips of conductive material can be eliminated.
申请公布号 US5589412(A) 申请公布日期 1996.12.31
申请号 US19950456548 申请日期 1995.06.01
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 IRANMANESH, ALI;PIERCE, JOHN M.;BERGEMONT, ALBERT M.
分类号 H01L21/8247;H01L27/115;(IPC1-7):H01L21/824 主分类号 H01L21/8247
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