发明名称 |
Power supply facility for monitoring cathodic protection installations |
摘要 |
A power supply for the cathodic protection of metal objects in a conducting medium compares reference and measured potentials with a pre-determined potential in the regulating circuit. Combined with an alarm circuit, the boundaries set for the supplied voltage and the protection current form a unique fully automatic system.
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申请公布号 |
NL1000656(C1) |
申请公布日期 |
1996.12.31 |
申请号 |
NL19951000656 |
申请日期 |
1995.06.26 |
申请人 |
VAN DER HEIDE BEHEER B.V. |
发明人 |
DRS. EDWARD POLS |
分类号 |
C23F13/04;G05F1/10;(IPC1-7):G05F1/10 |
主分类号 |
C23F13/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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