发明名称 Power supply facility for monitoring cathodic protection installations
摘要 A power supply for the cathodic protection of metal objects in a conducting medium compares reference and measured potentials with a pre-determined potential in the regulating circuit. Combined with an alarm circuit, the boundaries set for the supplied voltage and the protection current form a unique fully automatic system.
申请公布号 NL1000656(C1) 申请公布日期 1996.12.31
申请号 NL19951000656 申请日期 1995.06.26
申请人 VAN DER HEIDE BEHEER B.V. 发明人 DRS. EDWARD POLS
分类号 C23F13/04;G05F1/10;(IPC1-7):G05F1/10 主分类号 C23F13/04
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