发明名称 POLISHING COMPOSITION
摘要 FIELD: domestic chemistry, polishing compositions. SUBSTANCE: composition has the following components, wt.-%: ceresine 5-15; oligomers of ethylene C+ of molecular mass 470-550 25-35; alkenylsuccinic anhydride where C-C-alkenyl 0.05-0.15; protected alkylphenol 0.05-0.15, and hydrocarbon solvent - the rest. Composition can contain additionally polysiloxane liquid at amount 1-2 wt.-%. EFFECT: high protective properties, stability at storage, prevention of ultraviolet radiation on paint and varnish coatings.
申请公布号 RU95107931(A) 申请公布日期 1996.12.27
申请号 RU19950107931 申请日期 1995.05.16
申请人 TSVETKOV O.N.;KOLJANDRA JU.V. 发明人 TSVETKOV O.N.;KOLJANDRA JU.V.
分类号 C09G1/10 主分类号 C09G1/10
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