发明名称 |
PROCESS FOR TREATING DISSOCIATED ZIRCON |
摘要 |
FIELD: chemical industry. SUBSTANCE: claimed process for treating dissociated zircon comprises reacting dissociated ZIRCON with gaseous hydrogen fluoride at elevated temperature. Reaction temperature is regulated for preparation of at least one compound based on zirconium and at least one compound based on silicon. EFFECT: more efficient treatment process. |
申请公布号 |
RU95101439(A) |
申请公布日期 |
1996.12.27 |
申请号 |
RU19950101439 |
申请日期 |
1995.01.30 |
申请人 |
ATOMIK EHNERDZHI KORPOREHJSHN OF SOUF AFRIKA LIMITED |
发明人 |
DZHONATAN NEL |
分类号 |
C01G25/00;C01B33/107;C01B33/12;C01G25/02;C01G25/04 |
主分类号 |
C01G25/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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