发明名称 Continuous vacuum evaporation system
摘要 In order to form deposits of AlOx or of anothermetal oxide on plastic films, vapours of the component substances of the layer to be deposited and a gas such as oxygen or an oxygen-containing gas are introduced, which gas collides with the flow of vapours directed upon the film on which they are to condense; for the introduction of the gas, ionizers are provided which introduce the gas predominantly in the form of plasma generated in hollow cathodes. <IMAGE>
申请公布号 EP0750056(A1) 申请公布日期 1996.12.27
申请号 EP19960830340 申请日期 1996.06.14
申请人 GALILEO VACUUM TEC S.P.A. 发明人 FUSI, ANDREA
分类号 C23C14/00;C23C14/56 主分类号 C23C14/00
代理机构 代理人
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