发明名称 |
SELF-TRAPPING AND SELF-FOCUSING OF OPTICAL BEAMS IN PHOTOPOLYMERS |
摘要 |
A polymer material is exposed to radiation of a type that changes some aspect of the polymer's radiation passing properties. The radiation that caused the property change is then contained by the material. The property change can be self-focusing or self-trapping light can be used. In that case, the same light that causes the photopolymerization is contained by the change in index of refraction that is caused by the polymerization.
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申请公布号 |
WO9642036(A1) |
申请公布日期 |
1996.12.27 |
申请号 |
WO1996US10151 |
申请日期 |
1996.06.11 |
申请人 |
CALIFORNIA INSTITUTE OF TECHNOLOGY;KEWITSCH, ANTHONY, S.;YARIV, AMNON |
发明人 |
KEWITSCH, ANTHONY, S.;YARIV, AMNON |
分类号 |
G02B6/122;G02B6/13;G03F7/00;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G02B6/122 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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