发明名称 SELF-TRAPPING AND SELF-FOCUSING OF OPTICAL BEAMS IN PHOTOPOLYMERS
摘要 A polymer material is exposed to radiation of a type that changes some aspect of the polymer's radiation passing properties. The radiation that caused the property change is then contained by the material. The property change can be self-focusing or self-trapping light can be used. In that case, the same light that causes the photopolymerization is contained by the change in index of refraction that is caused by the polymerization.
申请公布号 WO9642036(A1) 申请公布日期 1996.12.27
申请号 WO1996US10151 申请日期 1996.06.11
申请人 CALIFORNIA INSTITUTE OF TECHNOLOGY;KEWITSCH, ANTHONY, S.;YARIV, AMNON 发明人 KEWITSCH, ANTHONY, S.;YARIV, AMNON
分类号 G02B6/122;G02B6/13;G03F7/00;G03F7/20;(IPC1-7):G03F7/20 主分类号 G02B6/122
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