发明名称 |
METHOD OF FORMING AUXILIARY ELECTRODE LAYER FOR COMMON ELECTRODE PATTERN IN THERMAL HEAD |
摘要 |
A method of forming an auxiliary electrode layer for a common electrode pattern in a thermal head. The method comprises the steps of preparing a master substrate (1') which has a common electrode pattern (4) on a surface thereof and accommodates for a plurality of head substrates, forming at least one slit (9) on the master substrate (1') along the common electrode pattern (4), and forming an auxiliary electrode layer (6) on the back surface of the master substrate (1') such that the auxiliary electrode layer (6) extends to be connected electrically with the common electrode pattern (4) through the slit (9). The slit (9) is regulated to have a width of 0.5 mm or more, preferably 0.8 mm or more so as to make an appropriate extent (R), over which the auxiliary electrode layer (6) extends. |
申请公布号 |
WO9641722(A1) |
申请公布日期 |
1996.12.27 |
申请号 |
WO1996JP01632 |
申请日期 |
1996.06.13 |
申请人 |
ROHM CO., LTD.;HOUKI, HIDEAKI |
发明人 |
HOUKI, HIDEAKI |
分类号 |
B41J2/335;(IPC1-7):B41J2/335 |
主分类号 |
B41J2/335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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