发明名称 METHOD OF FORMING AUXILIARY ELECTRODE LAYER FOR COMMON ELECTRODE PATTERN IN THERMAL HEAD
摘要 A method of forming an auxiliary electrode layer for a common electrode pattern in a thermal head. The method comprises the steps of preparing a master substrate (1') which has a common electrode pattern (4) on a surface thereof and accommodates for a plurality of head substrates, forming at least one slit (9) on the master substrate (1') along the common electrode pattern (4), and forming an auxiliary electrode layer (6) on the back surface of the master substrate (1') such that the auxiliary electrode layer (6) extends to be connected electrically with the common electrode pattern (4) through the slit (9). The slit (9) is regulated to have a width of 0.5 mm or more, preferably 0.8 mm or more so as to make an appropriate extent (R), over which the auxiliary electrode layer (6) extends.
申请公布号 WO9641722(A1) 申请公布日期 1996.12.27
申请号 WO1996JP01632 申请日期 1996.06.13
申请人 ROHM CO., LTD.;HOUKI, HIDEAKI 发明人 HOUKI, HIDEAKI
分类号 B41J2/335;(IPC1-7):B41J2/335 主分类号 B41J2/335
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