PRODUCTION OF OPTICAL WAVEGUIDE PART

摘要

PURPOSE: To provide a process for producing optical waveguide parts which does not induce the deterioration of the film quality of optical waveguides. CONSTITUTION: An oxidized film 2 for an etching mask is formed in regions excluding the parts to be etched of a silicon wafer 1 by using a mask 3 for a photoresist ((a)→(b)). The parts to be etched of the silicon wafer 1 are etched by using the oxidized film 2 as a mask, by which step parts 13 are formed as shown in (c). Next, the oxidized film 2 is removed as shown in (d) and a fresh oxidized film 2' is formed over the entire part on the front surface side including the step part 13 of the silicon waver as shown in (e). A quartz film 4 is formed in this state via the oxidized film 2' as shown in (f) and is subjected to plane polishing to form a lower clad layer 4a as shown in (g). A core layer 5 and an upper clad layer 4a are successively formed as shown in (h), by which the optical waveguides are formed in the step part 13 regions on the front surface side of the silicon wafer 1.