发明名称 |
POLYIMIDE PRECURSOR AND ITS PRODUCTION, POLYIMIDE AND ITS PRODUCTION, PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION OF POLYIMIDE PATTERN, AND PRODUCTION OF SEMICONDUCTOR ELEMENT |
摘要 |
PURPOSE: To obtain a polyimide precursor which has a high (i)-ray transmission and enables a good pattern shape to be formed with an (i)-ray stepper by using a polyimide precursor having specific repeating units. CONSTITUTION: A photosensitive polyimide precursor which has a high (i)-ray (wavelength: 365nm) transmission and enables a good pattern shape to be formed with an (i)-ray stepper is obtd. by using a polyimide precursor having repeating units represented by formula I [wherein R<1> is a tetravalent org. group; and R<2> is a group represented by formula II (wherein R<3> , R<4> , R<5> , and R<6> are each H or a monovalent org. group provided at least two of them are monovalent org. groups)] as the base polymer. |
申请公布号 |
JPH08337652(A) |
申请公布日期 |
1996.12.24 |
申请号 |
JP19960090661 |
申请日期 |
1996.04.12 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
HAGIWARA HIDEO;KOJIMA YASUNORI;KAJI MAKOTO;KOJIMA MITSUMASA;YOSHIKAWA HARUHIKO |
分类号 |
G03F7/037;C08F290/00;C08F290/06;C08G73/10;C08G73/12;H01L21/027;H01L21/312;(IPC1-7):C08G73/10 |
主分类号 |
G03F7/037 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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