| 摘要 |
<p>PURPOSE: To prevent the contact defect of TFT electrodes and pixel electrodes without increasing production stages. CONSTITUTION: Thin-film transistors(TFTs) and peripheral contact electrodes are formed on a transparent substrate l and a passivation film 9 is laminated thereon. Contact holes 10 are formed on the peripheral contact electrodes of the film and the electrodes of the TRs and a metallic film 12 is deposited and patterned, by which the metallic film 12 is patterned and formed on the channel parts of the TFTs and the contact hole parts. The light shielding films 11 on the channel parts 15 and the metallic films 12 on the contact holes 10 are formed in another islands and the light shielding films 12 on the channel parts 15 are made floating. Finally, a transparent conductive material is deposited and patterned to form pixel electrodes. Simultaneously, a transparent conductive layers 14 are patterned and formed on the light shielding films.</p> |
