| 摘要 |
<p>A MOS type semiconductor device, such as a MOSFET, has a plurality of inner quadrangular cells each comprised of a quadrangular channel region (3) of the second conductivity type (p) formed in a surface layer of a semiconductor substrate (1) of the first conductivity type (n), an well region (2) of high impurity concentration formed in the central portion of the channel region, a source region (4) of the first conductivity type (n) formed in a surface layer of the well region, and a MOS structure formed on the surface of the above described constituents. To improve the withstand voltage and avalanche withstand capability of such MOS type semiconductor device peripheral cells (19) which have at least a portion of the outermost side of their channel region in parallel to the side of a semiconductor chip, are formed on the outermost periphery, inside of which the quadrangular cells are formed, of the semiconductor chip, and the area of peripheral cells (19) are wider than the area of the inner quadrangular cells.</p> |
