发明名称 NONVOLATILE RANDOM ACCESS MEMORY AND ITS MANUFACTURE
摘要 PURPOSE: To prevent deterioration and removal caused since a capacitor ferroelectric film comes into direct contact with a layer insulation film such as an SiO2 film, an NSG film or a BPSG film by coating at least a lower electrode of a ferroelectric capacitor and a side wall of a capacitor ferroelectric film with a lamination film of a diffusion prevention film and an insulating thin film. CONSTITUTION: A lower electrode 7, a capacitor ferroelectric film 8 formed on the lower electrode 7 alone and an upper electrode 11 which functions as a drive line are laminated in a ferroelectric capacitor. The lower electrode 7 and a side wall of the capacitor ferroelectric film 8 are coated with a lamination film of a TiO2 film 9 and an SiO2 film 10 which has an opening on the capacitor ferroelectric film 8 and is formed all over from above the capacitor ferroelectric film 8 to above the layer insulation film 5. Since the TiO2 film 9 is provided between the capacitor ferroelectric film 8 and the SiO2 films 10 and 12 to prevent them from coming into contact with each other, the capacitor ferroelectric film 8 does not deteriorate and peel.
申请公布号 JPH08335673(A) 申请公布日期 1996.12.17
申请号 JP19950138262 申请日期 1995.06.05
申请人 SHARP CORP 发明人 ONISHI SHIGEO;ISHIHARA KAZUYA
分类号 H01L21/8247;H01L21/02;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/10;H01L27/105;H01L27/108;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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