发明名称 Field-effect transistor and method of manufacturing the same
摘要 On a semi-insulating substrate is formed a conductive layer and an undoped layer. On specified regions of the conductive layer are formed ohmic electrodes, each serving as a source electrode or a drain electrode, via a pair of square contact regions. The circumferential edges of the contact regions are undercut beneath the ohmic electrodes. Between the pair of contact regions on the conductive layer is formed a gate electrode by self alignment using the ohmic electrodes as a mask. The gate electrode has extended in the direction of gate width and the extended portion serves as a withdrawn portion of the gate electrode. Upper electrodes are formed by self alignment in the same process in which the gate electrode is formed.
申请公布号 US5585655(A) 申请公布日期 1996.12.17
申请号 US19950517435 申请日期 1995.08.21
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 OTA, YORITO;NISHII, KATSUNORI;NISHITSUJI, MITSURU;MASATO, HIROYUKI;FUJIMOTO, HIROMASA
分类号 H01L21/335;H01L29/10;H01L29/47;H01L29/812;(IPC1-7):H01L29/80 主分类号 H01L21/335
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