发明名称 High-purity, opaque quartz glass, method for producing same and use thereof
摘要 The high-purity, opaque quartz glass containing 3x106-9x106 of closed cells having an average size of 20-40 mu m per 1 cm3, a ratio of closed cells having sizes of 100 mu m or more to the whole of cells being 1% or less, thereby showing 5% or less of linear transmittance for near infrared rays ( lambda =900 nm) at a thickness of 1 mm is produced by compacting amorphous silica powder having an average particle size of 0.5-10 mu m, in which each of impurities selected from Li, Na, K, Fe, Ti and Al is 1 ppm or less, if any, and sintering the resultant green body at 1730 DEG -1850 DEG C.
申请公布号 US5585173(A) 申请公布日期 1996.12.17
申请号 US19940319570 申请日期 1994.10.07
申请人 TOSOH CORPORATION;NIPPON SILICA GLASS CO., LTD. 发明人 KAMO, KENJI;ONO, KOUICHI;TSUKUMA, KOJI;NAGATA, HIROYA;ABE, EMIKO;KIKUCHI, YOSHIKAZU;FUNAKOSHI, YUSHIHARU
分类号 C03B19/06;C03C3/06;(IPC1-7):C03B19/08 主分类号 C03B19/06
代理机构 代理人
主权项
地址