发明名称 |
High-purity, opaque quartz glass, method for producing same and use thereof |
摘要 |
The high-purity, opaque quartz glass containing 3x106-9x106 of closed cells having an average size of 20-40 mu m per 1 cm3, a ratio of closed cells having sizes of 100 mu m or more to the whole of cells being 1% or less, thereby showing 5% or less of linear transmittance for near infrared rays ( lambda =900 nm) at a thickness of 1 mm is produced by compacting amorphous silica powder having an average particle size of 0.5-10 mu m, in which each of impurities selected from Li, Na, K, Fe, Ti and Al is 1 ppm or less, if any, and sintering the resultant green body at 1730 DEG -1850 DEG C.
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申请公布号 |
US5585173(A) |
申请公布日期 |
1996.12.17 |
申请号 |
US19940319570 |
申请日期 |
1994.10.07 |
申请人 |
TOSOH CORPORATION;NIPPON SILICA GLASS CO., LTD. |
发明人 |
KAMO, KENJI;ONO, KOUICHI;TSUKUMA, KOJI;NAGATA, HIROYA;ABE, EMIKO;KIKUCHI, YOSHIKAZU;FUNAKOSHI, YUSHIHARU |
分类号 |
C03B19/06;C03C3/06;(IPC1-7):C03B19/08 |
主分类号 |
C03B19/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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