| 摘要 |
<p>PURPOSE: To make it possible to ensure light shielding by a simple method without using such intricate light shielding bands as used heretofore in the circumferential part of the effective region of a halftone type phase shift mask and to distinctly form auxiliary patterns, such as fiducial marks, in the case of providing such patterns in the circumferential part of the effective region in the mask. CONSTITUTION: Desired pattern images 10 are formed by translucent phase shift films 2a in the effective region 8 [size (a)×(b)] on a transparent substrate 1 and the outer peripheral part 9 enclosing this region is formed by the translucent phase shift films 2a and the light shielding film 11a laminated thereon. The light shielding film 11a is not allowed to remain on the patterns 10 in the effective region 8. The light shielding layer is made to remain on the auxiliary marks, such as fiducial marks, as well in the case where the inside of the outer peripheral part 9 is provided with these marks.</p> |
