| 摘要 |
<p>PURPOSE: To provide a method and device inspecting mask patterns in order to obtain a desired device structure and optimumly designing mask patterns. CONSTITUTION: Design pattern data are read-in by a processing means s12 from a mask pattern file f2 and are subjected to calculation of projected images, simulation of a subsequent process, etc. The plane shapes after processing of the device are predicted by a processing means 1. Rule violation points are extracted by using the rule of a device structure rule file 1 consisting of the data on the structure of the desired device expressed by the permissible area range of the patterns, the permissible size range of the patterns, the permissible distance range between the patterns, the margin for matching the patterns between the layers, etc., in a processing means s2. The display of the rule violation points is made by a processing means s3.</p> |
