发明名称 Method of making semiconductor laser
摘要 A method for fabricating a semiconductor laser includes forming a double heterojunction structure on a first conductivity type semiconductor substrate; forming the double heterojunction structure into a stripe mesa shape by selective etching; successively growing a first conductivity type layer, a second conductivity type current blocking layer, and a first conductivity type current blocking layer on opposite sides of the mesa to embed the mesa; and adding an impurity from a surface of the first conductivity type current blocking layer to form impurity doped regions that electrically separate the second conductivity type current blocking layer from an upper part of the mesa at opposite sides of the mesa.
申请公布号 US5585309(A) 申请公布日期 1996.12.17
申请号 US19940327841 申请日期 1994.10.17
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MORI, KENZO;KIMURA, TADASHI;KAWAMA, YOSHITATU;KANENO, NOBUAKI;KIMURA, TATUYA;OKURA, YUJI;TADA, HITOSHI
分类号 H01S5/00;H01S5/20;H01S5/22;H01S5/227;H01S5/323;(IPC1-7):H01L21/20 主分类号 H01S5/00
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