| 摘要 |
PURPOSE:To simplify the operation for adjusting the discharging position of a nozzle by waiting for the specification as a temporary reference position for a discharging position which is stipulated by a substrate treating procedure at the time of substrate processing, when a mode for adjusting the nozzle position is selected on a main operating panel, and quickly moving the nozzle for discharging a treating liquid from a stand-by position to this specified temporary reference position. CONSTITUTION:When the mode for adjusting the nozzle position is selected on the main operating panel 5, the specification as a temporary reference position for a discharging position which is stipulated by a substrate treating procedure at the time of substrate processing is waited, and the nozzle for discharging the treating liquid is quickly moved from the stand-by position to this specified temporary reference position. Also, the adjustment of the discharging position reached by the nozzle for discharging the treating liquid is performed by the simple prescribed key operation on sub operating panels 31A, 32A, and the discharging position after the adjustment is reflected on the position of the nozzle for discharging the treating liquid at the time of the substrate processing. Consequently, the nozzle moving operation to preliminarily move the nozzle for discharging the treating liquid from the stand-by position to the discharging position and the adjusting operation of the discharging position to be reached by the nozzle are simplified. |
