发明名称 Photosensitive lithographic printing plate containing a two-equivalent coupler residue-containing polymer
摘要 A photosensitive lithographic printing plate which provides a wide range of proper conditions for development, high impression capacity, a flexible film sufficient in adhesion to a support and excellent processing suitability with a weakly alkaline developer (pH 12.5 or less) is disclosed. The photosensitive lithographic printing plate comprises a support and a photosensitive layer provided thereon, wherein the photosensitive layer is formed from a photosensitive composition containing at least a two-equivalent coupler residue-containing compound and a photosensitive compound or a photosensitive mixture acting as a positive type.
申请公布号 US5582952(A) 申请公布日期 1996.12.10
申请号 US19950399585 申请日期 1995.03.07
申请人 FUJI PHOTO FILM CO., LTD. 发明人 KAWAMURA, KOICHI;AKIYAMA, KEIJI;INNO, TOSHIFUMI;KITATANI, KATSUJI
分类号 G03F7/039;B41N1/08;B41N3/03;G03F7/00;G03F7/023;G03F7/30;(IPC1-7):G03C1/52 主分类号 G03F7/039
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