发明名称 RELIEF IMAGE FORMING MATERIAL USING SYNDIOTACTIC POLYSTYRENE SUBSTRATE
摘要 PURPOSE: To form an image having high image quality, free from unevenness and not causing peeling by using a film composed of essentially syndiotactic polystyrene and having a specified thickness as a substrate. CONSTITUTION: This relief image forming material uses a syndiotactic polystyrene-based film of 15-300μm thickness as the substrate and has a photosensitive layer on at least one side of the substrate. The syndiotactic polystyrene- based film is formed by working a styrene polymer whose principal chain is chiefly a racemic chain or a compsn. contg. the polymer into a film. The monomer of the polymer is, e.g., styrene, alkylstyrene, halogenated alkylstyrene, alkoxystyrene or vinylbenzoic ester.
申请公布号 JPH08314146(A) 申请公布日期 1996.11.29
申请号 JP19950119881 申请日期 1995.05.18
申请人 KONICA CORP 发明人 NAKAJIMA AKIHISA
分类号 G03F7/004;G03F3/10;G03F7/09;(IPC1-7):G03F7/09 主分类号 G03F7/004
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