| 摘要 |
PURPOSE: To obtain a device at high production yield in a smaller number of processes although a color filter and the like is formed on a substrate where thin film transistors are formed. CONSTITUTION: Conductive color resists 206-208 are applied as a color filter and these color resists 206-208 are used as the pixel electrodes of a liquid crystal display device. Or the color resist may be used as a mask to form a black matrix by LPD method. Or a conductive layer may be formed to connect the conductive color resists 206-208 and a drain area 209. The conductive layer is preferably made of the same material as the source line and preferably formed in the peripheral part of the color resists 206-208. A conductive color layer may be formed on the upper part of the pixel electrode to obtain a reflection type liquid crystal display device. Or the color resist is formed on the upper part of the pixel electrode so that the color resist is used to pattern the pixel electrode. Further, the resist for patterning of pixel electrode may be used to form an insulating film 220 as a protective film by LPD method. |
