SUBSTRATE TREATMENT APPARATUS

摘要

PURPOSE: To prevent a turbulent flow from being produced, wound up on a substrate surface and hereby prevent any contaminated matter around the substrate from adhering to the substrate. CONSTITUTION: A shielding plate 22 is disposed oppositely to a substrate W held on a substrate holder 11. An inactive gas is supplied to a space between the substrate W and the shielding plate 22 and simultaneously a treatment solution is supplied to the substrate W surface. The inactive gas flows along the substrate W surface in the space between the substrate W and the shielding plate 22, so that a turbulent flow wound up on the substrate W surface is prevented from being produced. For this, any contaminated matter is prevented from adhering to the substrate W for improvement of the quality of the substrate.