发明名称 WAFER PROCESSING DEVICE
摘要 <p>PURPOSE: To provide a wafer processing chamber, in which a vacuum is maintained. CONSTITUTION: A wafer processing chamber 40 has a lift pin accommodating part 43. The lift pin accommodating part 43 has a cylinder and a bottom plate. A lift pin 50 has an intermediate pillar part 52 near a lower end and is accommodated in the lift pin accommodating part 43 so as to move vertically. A drive body 60 is magnetically coupled to the lift pin 50. When the drive body 60 moves vertically, the lift pin 50 moves vertically in the lift pin accommodating part 43.</p>
申请公布号 JPH08316292(A) 申请公布日期 1996.11.29
申请号 JP19950121324 申请日期 1995.05.19
申请人 FUJITSU LTD 发明人 WAKITA TADAHARU
分类号 H01L21/302;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 主分类号 H01L21/302
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