发明名称 TINIEST TRACE OF IMPURITY MEASURING METHOD
摘要 PURPOSE: To attain a high speed response characteristic by which a trace of impurity can be measured in a short time by measuring a transiently changing trace of gas concentration. CONSTITUTION: A substitutive characteristic when CH4 gas remaining in T-shaped piping 17 of a dead space part is substituted with H2 gas by various purge methods is evaluated. First of all, valves 7, 9 and 11 are opened, and after CH4 gas of 1kgf/cm<2> is introduced to the piping 17, the valves are closed, a next, valves 2, 5, 6, 4 and 13 are opened, and N gas is introduced to an atmospheric pressure mass spectrometer 15. An N2 gas flow rate at this time is set in 1L/min by a mass flow controller 16. Similarly, CH4 is introduced to the piping 17, and after a batch purge, N2 gas is flowed, and is introduced to the mass spectrometer 15, and the CH4 gas concentration is measured. A batch purge of one time is performed in such a way that the valves 7, 9 and 12 are opened, and after pressure of the piping 17 is reduced for five seconds, the valve 9 is closed, and the valves 2, 8 and 10 are opened, and N2 is filled, and the valves are closed. Therefore, concentration change can be detected in a short time.
申请公布号 JPH08315769(A) 申请公布日期 1996.11.29
申请号 JP19950120239 申请日期 1995.05.18
申请人 MOTOYAMA SEISAKUSHO:KK 发明人 SUGANO YOICHI;UCHISAWA OSAMU;KIYONO FUMIYUKI
分类号 G01N27/62;H01J49/42;(IPC1-7):H01J49/42 主分类号 G01N27/62
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