发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE AND ITS DEVELOPING METHOD
摘要 PURPOSE: To provide a photosensitive compsn. having excellent coatability as well as a photosensitive planographic printing plate having excellent adaptability to an aq. alkaline soln. and its developing method. CONSTITUTION: This photosensitive compsn. is prepd. by mixing (1) a solvent having a viscosity of 0.3 to 2.7cps at 20 deg.C and a solvent having a viscosity of 2.9 to 8.0cps at 20 deg.C or (2) a solvent having surface tension of 15 to 25dyne/ cm at 20 deg.C and a solvent having surface tension of 26 to 55dyne/cm at 20 deg.C or (3) a solvent having a sp. gr. of 0.80 to 0.93g/cm<3> at 20 deg.C and a solvent having a sp. gr. of 0.94 to 2.00g/cm<3> at 20 deg.C. This photosensitive planographic printing plate is formed by applying either one of the photosensitive compsns. (1) to (3) on a base having hydrophilicity. This method for developing the photosensitive planographic printing plate described above comprises developing the printing plate with the aq. alkaline soln. having pH of >=12.
申请公布号 JPH08314134(A) 申请公布日期 1996.11.29
申请号 JP19950138518 申请日期 1995.05.12
申请人 KONICA CORP;MITSUBISHI CHEM CORP 发明人 KIZU NORIYUKI;ISHII NOBUYUKI;MATSUMURA TOMOYUKI;TSUJI SHIGEO;MATSUO FUMIYUKI
分类号 G03F7/004;G03F7/00;G03F7/016;G03F7/021;G03F7/027;G03F7/028;G03F7/32;(IPC1-7):G03F7/016 主分类号 G03F7/004
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