发明名称 Verfahren zur hochfrequenzbetriebenen Magnetron-Glimmentladungsionisation, sowie Ionenquelle
摘要 The invention relates to a process for ionising sample material in which a plasma is generated on a target containing the sample material by means of a high-frequency-operated magnetron glow discharge and sample material is released from the target with the aid of a sputter gas for transmission to a mass spectrometer and ionised. Here a magnetic field is generated on the surface of the target in such a way that the magnetic field lines in the plasma region are oriented towards the target surface. It is of advantage to arrange a magnet on the side of the target away from the plasma in such a way that the magnetic field lines in the plasma region are oriented towards the target surface.
申请公布号 DE19518374(A1) 申请公布日期 1996.11.28
申请号 DE19951018374 申请日期 1995.05.23
申请人 FORSCHUNGSZENTRUM JUELICH GMBH, 52428 JUELICH, DE 发明人 SAPRYKIN, ANATOLIJ, DR., 52428 JUELICH, DE;BECKER, SABINE, DR., 52391 VETTWEIS, DE;DIETZE, HANS-JOACHIM, DR., 52385 NIDEGGEN, DE
分类号 H01J49/10;(IPC1-7):H01J37/08;H01J27/10;H01J49/12;H05H1/30 主分类号 H01J49/10
代理机构 代理人
主权项
地址