| 摘要 |
<p>A substrate heater having a chamber (12), a heating element (28) located in the chamber (12), and an elevator (14) having a substrate holder. The holder can hold a plurality of planar substrates in a general spaced stacked configuration. The holder can be moved to allow substrates to be inserted and removed from various locations on the holder. In one embodiment the substrates are located very close to each other to accelerate the rate of heat transfer to newly inserted substrates. In another embodiment, the holder has an individual horizontal heater on the elevator (14) for each substrate.</p> |
