发明名称 Method and apparatus for hot carrier injection
摘要 <p>The invention is directed to a memory cell with a floating gate and a method for charging the floating gate using channel-initiated secondary electron injection (CISEI). In the device of the present invention, a positive bias voltage of about 1.1 volts to about 3.3 volts is applied between the drain and the source when introducing charge onto the floating gate. A negative bias voltage of about -0.5 volts or more negative is applied to the substrate and the source. The drain substrate bias induces a sufficient amount of secondary hot electrons to be formed with a sufficient amount of energy to overcome the energy barrier between the substrate and the floating gate to charge the floating gate. &lt;IMAGE&gt;</p>
申请公布号 EP0744754(A2) 申请公布日期 1996.11.27
申请号 EP19960303419 申请日期 1996.05.15
申请人 AT&T CORP. 发明人 BUDE, JEFFREY DEVIN;PINTO, MARK RICHARD;O'CONNOR, KEVIN JOHN
分类号 G11C17/00;G11C16/04;G11C16/10;G11C16/12;G11C16/34;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):G11C16/06 主分类号 G11C17/00
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