| 摘要 |
When light enters a solid-state imaging device obliquely, the light passing an optical path which misses a photodiode part is gathered by a second microlens located in the lower part which directs the light more vertically. A convergent rate of the oblique incident light can be prevented from decreasing. In this way, a solid-state imaging device having high sensitivity ratio, less smear (stray light), and excellent image characteristics can be provided. A metal with a high melting point or a metal silicide film thereof is used as a photo-shielding film 7. After making the photo-shielding film thinner, a Boro-Phospho-Silicate-Glass (BPSG) film 6 is provided on the entire surface. Then, the second microlens 2 is directly formed on an element provided with a surface protective coating 5 comprising SiO2, SiON, or SiN, and on top of that, a color filter 4 and an intermediate transparent film 3 are formed, and then a first microlens 1 is formed thereon. The second microlens 2 located in the lower part is formed using a material having a larger refractive index than that of the intermediate transparent film 3 or the BPSG film 6. <IMAGE> |
