| 摘要 |
A coated substrate, includes a substrate; at least one primary coating layer formed on the substrate; and a sputtered protective layer which is provided by cathode vacuum sputtering on an outermost coating layer of the at least one primary coating layer, which is exposed, which is composed of a material having a refractive index of less than 1.7 and comprising at least one substance selected from the group consisting essentially of oxides of silicon, oxynitrides of silicon, and mixtures of at least one of oxides of silicon, nitrides of silicon, and oxynitrides of silicon, and which has a thickness ranging from 1 to 10 nm, wherein the material of the sputtered protective layer additionally comprises not more than 10% by weight of a further substance which is one of an oxide of a silicon dopant or an oxynitride of a silicon dopant. |
