| 摘要 |
PURPOSE: To provide a method and device for polishing one surface of a workpiece by which high accurate polishing work can be performed by avoiding a harmful influence of periodic motion in polishing work. CONSTITUTION: In a lens polishing device 10, a workpiece support plate 14 is arranged to be opposed to a polishing surface of a lower surface plate 12, to bring a workpiece 23 supported to the workpiece support plate 14 into contact with a polishing surface 12A. In this condition, the workpiece 23 is moved by a periodically polishing motion locus against the polishing surface 12A, to polish one surface of the workpiece 23 by the polishing surface 12A. This lens polishing device 10 is provided with a phase changing means. By shifting a phase of the periodic polishing motion locus of the workpiece 23 by this phase changing means, an influence of periodicity of motion in polishing work is relaxed. |
