发明名称 |
Apparatus and method for manufacturing semiconductors |
摘要 |
A semiconductor manufacturing apparatus having a vibration insulation apparatus with a damper for insulating floor vibrations is so designed that damping characteristics of a damper can be changed. Thus, a semiconductor manufacturing apparatus capable of preventing floor vibrations from being transmitted to the apparatus and efficiently attenuating vibrations generated by the apparatus can be provided.
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申请公布号 |
US5579084(A) |
申请公布日期 |
1996.11.26 |
申请号 |
US19940332498 |
申请日期 |
1994.10.31 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TAKAHASHI, KAZUO;INOUE, MITSURU |
分类号 |
F16F9/53;F16F15/00;F16F15/027;G03F7/20;H01L21/027;H01L21/30;H01L21/67;(IPC1-7):G03B27/42 |
主分类号 |
F16F9/53 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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