发明名称 Apparatus and method for manufacturing semiconductors
摘要 A semiconductor manufacturing apparatus having a vibration insulation apparatus with a damper for insulating floor vibrations is so designed that damping characteristics of a damper can be changed. Thus, a semiconductor manufacturing apparatus capable of preventing floor vibrations from being transmitted to the apparatus and efficiently attenuating vibrations generated by the apparatus can be provided.
申请公布号 US5579084(A) 申请公布日期 1996.11.26
申请号 US19940332498 申请日期 1994.10.31
申请人 CANON KABUSHIKI KAISHA 发明人 TAKAHASHI, KAZUO;INOUE, MITSURU
分类号 F16F9/53;F16F15/00;F16F15/027;G03F7/20;H01L21/027;H01L21/30;H01L21/67;(IPC1-7):G03B27/42 主分类号 F16F9/53
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