TITANIUM SPUTTERING TARGET AND ITS MANUFACTURE

摘要

PURPOSE: To provide a target having a high film forming efficiency in contact holes. CONSTITUTION: In this manufacture, crystals in the target surface are oriented so that the X-ray defraction intensity of the (101'0) planes and/or (112'0) planes each perpendicular to the closest-packed face is 1.1 times as much as that of the crystals when they are randomly oriented and the X-ray diffraction intensity of (0002) planes each parallel to the closest-packed face is <1 time as much as that of the crystals when they are randomly oriented. Thus, the released directions of sputtered particles from the target surface are controlled so as to be perpendicular to the target surface.