| 摘要 |
PURPOSE: To obtain a pressure-sensitive adhesive which can simply and surely remove an ion-injected resist film image usually difficult to remove by incorporating a specific substance into a pressure-sensitive adhesive for resist removal. CONSTITUTION: A substance which, as it is or as a soln., exhibits a pH of 6 or higher is incorporated into a pressure-sensitive adhesive for resist removal. Pref. examples of the substance are hydroxyl compds. [e.g. ammonia, ammonia derivs. (e.g. tetramethylammonium hydroxide, tetraethylammonium hydroxide, and tetra-n-butylammonium hydroxide), KOH, NaOH, and Mg(OH)2 ] and amide compds. (e.g. N-methylpyrrolidone, N-vinylpyrrolidone. 1,3-dimethyl-2- imidazolidine, and dimethylformamide). |
