| 摘要 |
PURPOSE: To position and fix a substrate while securing a reference position in a state wherein the level is maintained constant by a method wherein the carried-in substrate to be treated is fixed to a substrate vertical movement-controlling part through a stopper part and the substrate to be treated is pushed up to a reference position control means in the state of being sucked and positioned. CONSTITUTION: A substrate 8 to be treated, which is carried in from the side of a substrate carrying-in mechanism 35, is fixed to a pair of supporting parts 13 and 13 formed on a substrate vertical movement-control part 12 in a manner that the substrate 8 is brought into contact with the stop plate 18 of a stopper 17 which is protruding above the conveying surface. After the position of the substrate 8 has been fixed by the sucking part 22 of a vacuum suction part 21, it is pushed up to the side of a reference position controlling means 25. The edge parts on both sides of the substrate 8 are brought into contact with a pair of face height controlling arm parts 26 which constitutes a reference position controlling means 25, and the substrate 8 can be fixed while the reference position is being maintained in the state wherein the surface height of the surface 9 to be treated is always constantly maintained. The position of the substrate 8 can be controlled accurately by the guiding pin 27 of the reference position-controlling means 25 to the positioning hole 10 of the substrate 8. |
