发明名称 POSITIVE RESIST COMPOSITION
摘要 PURPOSE: To obtain a compsn. excellent in various properties such as profile, appliability and heat resistance by incorporating a quinonidiazido compd., an alkali-soluble resin and a solvent system contg. 2-heptanone, ethyl lactate andγ-butyrolactone. CONSTITUTION: This compsn. contains a quinonediazido compd., an alkali-soluble resin and a solvent system contg. 2-heptanone, ethyl lactate andγ-butyrolactone. The quinonediazido compd. is usually quinone diazidosulfonic ester, especially o-quinonediazidosulfonic ester of a compd. having a phenolic hydroxyl group. The o-quinonediazidosulfonic ester is, e.g. 1,2-benzoquinonediazido-4-sulfonic ester. Such o-quinonediazidosulfonic ester can be produced by condensing a compd. having a phenolic hydroxyl group and o-quinonediazidosulfonic acid halide in the presence of an org. or inorg. base.
申请公布号 JPH08305014(A) 申请公布日期 1996.11.22
申请号 JP19950110414 申请日期 1995.05.09
申请人 SUMITOMO CHEM CO LTD 发明人 NANBA KATSUHIKO;TACHIKAWA KO;MORIUMA HIROSHI;KAMIYA YASUNORI
分类号 G03F7/004;G03F7/022;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/004
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