PHOTORESIST STRIPPER COMPOSITION CONTAINING CHELATING AGENT

摘要

PROBLEM TO BE SOLVED: To provide a new noncorrosive photoresist stripper composition. SOLUTION: This noncorrosive photoresist stripper composition is composed of (a) an organic polar solvent of 20 to 70wt.% having the dipole moment larger than 3.5, (b) a specific amine compound of 70 to 20wt.%, (c) a chelating agent formed by bonding a ligand of a monovalent or polyhydric acid type to a pricipal chain of a polymer or an oligomer of an effective quantity by a covalent bond and (d) specific amino acid having a hydroxyl group of 0 to 10wt.% according to circumstances.