| 摘要 |
PURPOSE: To obtain a compsn. effectively suppressing the generation of scum, excellent in developability in the case of a fine pattern and suitable for use as a positive type resist having high resolution and excellent in heat resistance by incorporating an alkali-soluble resin and a specified compd. CONSTITUTION: This compsn. contains an alkali-soluble resin and a compd. represented by the formula wherein each of X1 -X10 and Y1 -Y4 is H, alkyl, alkoxyl or a group represented by -OD (D is H or an org. group contg. a 1,2- quinonediazido group), each of Z1 -Z5 is H, halogen, alkyl, alkoxyl, cyano, nitro, dialkylamino, alkylene-dioxy or a group represented by -OD and at least one of X1 -X5 and at least one of X6 -X10 are groups represented by-OD. The alkali- soluble resin is, e.g. novolak resin, polyvinyl phenol or its deriv. |
