| 摘要 |
PURPOSE: To provide a coating compsn. for improvement in performances of lithography and to provide a pattern forming method using this coating compsn. CONSTITUTION: This coating compsn. is a water-soluble compsn. to be applied on the upper surface of a chemically amplifying type photoresist compsn. coating film. Moreover, the coating compsn. contains a photosensitive acid producing compd. and has pH>=4. The coating compsn. above described is applied on the upper surface of a chemically amplifying photoresist compsn. coating film formed on a substrate, irradiated with light to transfer a latent image of a pattern, then heat treated and developed. Thereby, by only applying one kind of surface coating compsn., a good pattern can be formed having high resolution, good shape and focal depth of the transferred pattern and less changes in the dimension of the transferred pattern without depending on the coating film thickness. |
