| 摘要 |
PURPOSE:To steady form functional deposited film with high efficiency by the title method by providing a gaseous atmosphere sealing means having a specified linear expansion coefficient between a microwave introducing window for introducing microwave energy and the wall of a vacuum vessel. CONSTITUTION:The microwave 106 is introduced through the microwave introducing window 102 consisting of a microwave transmitting substance, and the functional deposited film is formed on a substrate in the vacuum vessel by the microwave CVD method. At this time, a material having <=10X10<-6> difference in the linear expantion coefficient from the microwave transmitting substance is used for the gaseous atmosphere keeping gasket 103 for sealing a gap between the wall surface 101 of the vacuum vessel and the microwave introducing window 102. For example, when an alumina ceramic disk is used for the microwave transmitting substance, fernico, platinum, nickel, etc., are used for the gasket 103. As a result, a relatively thick deposited film can be formed on a large-area substrate at a high film forming rate. |
