| 摘要 |
PURPOSE:To obtain a film superior in scratch resistance and high-temperature muk by making a parameter of surface roughness so as to fall within a specific range. CONSTITUTION:A parameter Rz/Rt of surface roughness, Sm and a self mutual relational distance on at least one surface are made respectively at least 0.85, 6.0mum or less and 3.0mum or less. When the Rx/Rt is less than 0.85, it is unable to satisfy scratch resistance. When the Sm exceeds 6.0mu, it is unable to satisfy the scratch resistance. Then when the self mutual relational distance exceeds 3.0mu, it is unable to satisfy the scratch resistance and high-temperature muk. |
