发明名称 |
Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst |
摘要 |
A novel positive type photoresist composition is provided, comprising an alkali-soluble novolak resin obtained by the condensation of substituted or unsubstituted phenols and aldehydes in the presence of a silica-magnesia solid catalyst and a light-sensitive material containing 1,2-naphthoquinone-diazido-5-(and/or -4-) sulfonate as main component.
|
申请公布号 |
US5576139(A) |
申请公布日期 |
1996.11.19 |
申请号 |
US19910783346 |
申请日期 |
1991.10.28 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
UENISHI, KAZUYA;TAN, SHIRO;KAWABE, YASUMASA;KOKUBO, TADAYOSHI |
分类号 |
C08G8/08;C08L61/04;C08L61/06;G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/023 |
主分类号 |
C08G8/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|